Choice of amines as stabilizers for chemically amplified resist systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 236-244

  Ferreira, Lawrence ^a   Malik, Sanjay ^a   Sarubbi, Thomas R ^a   Blakeney, Andrew J ^a   Maxwell, Brian ^a  

^a Olin Microelectronic Materials   (United States)

Author keywords

Acetals; Amines; PED; Shelf life; Storage stability

Indexed keywords

ACIDS; AMINATION; COAGULATION; GELATION; PHOTORESISTORS; PHOTORESISTS; POLYDISPERSITY; SALTS; SYSTEM STABILITY;

ACETALS; AMINE SALTS; CHEMICALLY AMPLIFIED RESISTS; CONJUGATE ACIDS; ENVIRONMENTAL CONTAMINANTS; LOW TEMPERATURES; PED; POLYMER MOLECULAR WEIGHTS; RESIST MATRIXES; RESIST SYSTEMS; SHELF LIFE; STORAGE STABILITY; THERMALLY STABLES;

AMINES;

EID: 14344275724     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312413     Document Type: Conference Paper

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