Electron Beam Nanolithography of β-Ketoester Modified Aluminium Tri-Sec-Butoxide

Journal of Sol-Gel Science and Technology

Volumn 29, Issue 1, 2004, Pages 5-10

  Saifullah, M S M ^a   Kang, Dae Joon ^a   Subramanian, K R V ^a   Welland, M E ^a   Yamazaki, K ^b   Kurihara, K ^c  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

^c NTT Advanced Technology Corporation   (Japan)

Author keywords

Aluminium oxide; Chelating agents; Electron beam nanolithography; Inorganic resists; Metal alkoxides

Indexed keywords

ALUMINA; CHELATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON ENERGY LOSS SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR WEIGHT; NANOTECHNOLOGY; SENSITIVITY ANALYSIS; SPIN COATING; SYNTHESIS (CHEMICAL); THIN FILMS;

CHELATING AGENTS; ELECTRON BEAM NANOLITHOGRAPHY; INORGANIC RESISTS; METAL ALKOXIDES;

ESTERS;

EID: 1842451896     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JSST.0000016131.35342.2f     Document Type: Article

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