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Volumn 252, Issue 4-6, 2005, Pages 344-354

Scattering properties of ordered mesoporous silica films

Author keywords

Materials and process characterization; Optical properties; Rayleigh; Scattering; Thin flims

Indexed keywords

CHARACTERIZATION; ENVIRONMENTAL IMPACT; LIGHT SCATTERING; MESOPOROUS MATERIALS; POROSITY; RAYLEIGH SCATTERING; SILICA;

EID: 22544482990     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2005.04.032     Document Type: Article
Times cited : (10)

References (41)
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    • J.A. Woollam Co., Inc., 645 M. Street, Suite 102 Lincoln, NE 68508, USA
    • Wvase 32, from J.A. Woollam Co., Inc., 645 M. Street, Suite 102 Lincoln, NE 68508, USA. Available from:
    • Wvase , vol.32
  • 28
    • 52249105481 scopus 로고    scopus 로고
    • Virginia Semiconductor, Inc. 1501 Powhatan Street, Fredericksburg, Va 22401, Optical Properties of Silicon. Available from:
    • Optical Properties of Silicon
  • 34
    • 85069411049 scopus 로고    scopus 로고
    • Appareil et procédé de caractérisation optique d'un objet, CNRS Patent Nos. 0115232, 23.11
    • V.A. Sterligov, P. Cheyssac, Appareil et procédé de caractérisation optique d'un objet, CNRS Patent Nos. 0115232, 23.11.2001
    • (2001)
    • Sterligov, V.A.1    Cheyssac, P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.