Two-step annealing for nickel-induced crystallization of amorphous silicon films

Journal of the Electrochemical Society

Volumn 152, Issue 6, 2005, Pages

  Hwang, Jun Dar ^a   Chang, Jyh Yeu ^a   Chen, G J ^b  

^a DA YEH UNIVERSITY   (Taiwan)

^b I SHOU UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; NICKEL; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; THIN FILM TRANSISTORS; X RAY DIFFRACTION;

CONVENTIONAL FURNACE ANNEALING (CFA); GLASS MELTING TEMPERATURE; METAL-INDUCED CRYSTALLIZATION (MIC); NOVEL ANNEALING METHODS;

POLYSILICON;

EID: 22544444262     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1905969     Document Type: Article

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