SCOPUS 정보 검색 플랫폼

Surface Science

Volumn 588, Issue 1-3, 2005, Pages 175-183

Pulsed-laser deposition of polycrystalline Ni films: A three-dimensional kinetic Monte Carlo simulation

(3) Tan, X a Zhou, Y C a Zheng, X J a

a XIANGTAN UNIVERSITY (China)

Author keywords

Kinetic Monte Carlo simulations; Nickel; Polycrystalline thin film growth; Pulsed laser deposition

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; MOLECULAR BEAM EPITAXY; MONTE CARLO METHODS; NICKEL; PULSED LASER DEPOSITION; SUBSTRATES; THIN FILMS; FILM GROWTH; POLYCRYSTALLINE MATERIALS; SURFACE PROPERTIES;

INCIDENT ATOMS; POLYCRYSTALLINE THIN FILM GROWTH; POLYCRYSTALLINE THIN FILMS; SURFACE DIFFUSION; GROWTH CONDITIONS; KINETIC MONTE CARLO SIMULATIONS;

POLYCRYSTALLINE MATERIALS; THIN FILMS;

EID: 22344437364 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/j.susc.2005.05.047 Document Type: Article

Times cited : (22)

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