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Volumn 45, Issue 5, 2001, Pages 743-749

Characterization of MOSFETs fabricated on large-grain polysilicon on insulator

Author keywords

3 D VLSI; MILC; MIUC; SOI material and technology; Thin film transistor

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CRYSTALLIZATION; POLYSILICON; SILICON ON INSULATOR TECHNOLOGY; STATISTICAL METHODS; THIN FILM TRANSISTORS; VLSI CIRCUITS;

EID: 0035333264     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(01)00031-4     Document Type: Article
Times cited : (18)

References (24)
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  • 2
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  • 3
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  • 11
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    • Lee, S.1    Joo, S.2
  • 13
    • 36449004575 scopus 로고
    • Silicide formation and silicide mediated crystallization of nickel implanted amorphous silicon thin films
    • (1993) J Appl Phys , vol.73 , Issue.12 , pp. 8279-8289
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  • 15
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    • Kinetics of nickel-induced lateral crystallization of amorphous silicon thin-film transistors by rapid thermal and furnace anneals
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    • Lam, L.K.1    Chen, S.2    Ast, D.G.3
  • 19
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    • Self-aligned nickel-mono-silicide technology for the high speed deep submicrometer logic CMOS ULSI
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    • Morimoto, T.1
  • 23


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.