-
1
-
-
0032657527
-
-
P. O'Dette, G. Tarnowski, V. Lukah, M. Krueger, and P. Lovecchip, J. Electron. Mater. 28, 821 (1999).
-
(1999)
J. Electron. Mater.
, vol.28
, pp. 821
-
-
O'Dette, P.1
Tarnowski, G.2
Lukah, V.3
Krueger, M.4
Lovecchip, P.5
-
2
-
-
0036638813
-
-
A.J. Stoltz, J.D. Benson, Mason Thomas, P.R. Boyd, M. Martinka, and J.H. Dinan, J. Electron. Mater. 31, 749 (2002).
-
(2002)
J. Electron. Mater.
, vol.31
, pp. 749
-
-
Stoltz, A.J.1
Benson, J.D.2
Thomas, M.3
Boyd, P.R.4
Martinka, M.5
Dinan, J.H.6
-
3
-
-
0043269236
-
-
A.J. Stoltz, J.D. Benson, P.R. Boyd, J.B. Varesi, M. Martinka, A.W. Kaleczyc, E.P. Smith, S.M. Johnson, W.A. Radford, and J.H. Dinan, J. Electron. Mater. 32, 692 (2003).
-
(2003)
J. Electron. Mater.
, vol.32
, pp. 692
-
-
Stoltz, A.J.1
Benson, J.D.2
Boyd, P.R.3
Varesi, J.B.4
Martinka, M.5
Kaleczyc, A.W.6
Smith, E.P.7
Johnson, S.M.8
Radford, W.A.9
Dinan, J.H.10
-
4
-
-
0041766135
-
-
E.P.G. Smith, J.K. Gleason, L.T. Pham, E.A. Patten, and M.S. Welkowsky, J. Electron. Mater. 32, 816 (2003).
-
(2003)
J. Electron. Mater.
, vol.32
, pp. 816
-
-
Smith, E.P.G.1
Gleason, J.K.2
Pham, L.T.3
Patten, E.A.4
Welkowsky, M.S.5
-
7
-
-
0005585024
-
-
R.C. Keller, H. Zimmerman, M. Seelmann-Eggebert, and H.J. Richter, J. Electron. Mater. 25, 1270 (1996).
-
(1996)
J. Electron. Mater.
, vol.25
, pp. 1270
-
-
Keller, R.C.1
Zimmerman, H.2
Seelmann-Eggebert, M.3
Richter, H.J.4
-
8
-
-
0000137368
-
-
R.C. Keller, H. Zimmerman, M. Seelmann-Eggebert, and H.J. Richter, J. Electron. Mater. 26, 542 (1997).
-
(1997)
J. Electron. Mater.
, vol.26
, pp. 542
-
-
Keller, R.C.1
Zimmerman, H.2
Seelmann-Eggebert, M.3
Richter, H.J.4
-
9
-
-
0038663128
-
-
E. Neyts, M. Uan, A. Bogaerts, and R. Gijbels, J. Appl. Phys. 93, 5025 (2003).
-
(2003)
J. Appl. Phys.
, vol.93
, pp. 5025
-
-
Neyts, E.1
Uan, M.2
Bogaerts, A.3
Gijbels, R.4
-
10
-
-
0003955602
-
-
Cambridge, United Kingdom: Cambridge University Press
-
M. Elwenspoek and H.V. Jansen, Silicon Micromachining (Cambridge, United Kingdom: Cambridge University Press, 1998), pp. 212-233.
-
(1998)
Silicon Micromachining
, pp. 212-233
-
-
Elwenspoek, M.1
Jansen, H.V.2
-
12
-
-
21644489128
-
-
New York: Kluwer Academic/Plenum Publishers
-
Francis F. Chen and Jane P. Chang, Plasma Diagnostics (New York: Kluwer Academic/Plenum Publishers, 2003), pp. 75-97.
-
(2003)
Plasma Diagnostics
, pp. 75-97
-
-
Chen, F.F.1
Chang, J.P.2
-
15
-
-
21644455911
-
-
J.D. Benson, A.J. Stoltz, J.B. Varesi, L.A. Almeida, E.P.G. Smith, S.M. Johnson, M. Martinka, A.W. Kaleczyc, J.K. Markuna, P.R. Boyd, and J.H. Dinan, J. Electron. Mater. 34, 726 (2005).
-
(2005)
J. Electron. Mater.
, vol.34
, pp. 726
-
-
Benson, J.D.1
Stoltz, A.J.2
Varesi, J.B.3
Almeida, L.A.4
Smith, E.P.G.5
Johnson, S.M.6
Martinka, M.7
Kaleczyc, A.W.8
Markuna, J.K.9
Boyd, P.R.10
Dinan, J.H.11
-
16
-
-
0007146606
-
-
K. Suzuki, K. Ninomiya, S. Nishimatsu, and S. Okudaira, J. Vac. Sci. Technol. B, 3, 1025 (1985).
-
(1985)
J. Vac. Sci. Technol. B
, vol.3
, pp. 1025
-
-
Suzuki, K.1
Ninomiya, K.2
Nishimatsu, S.3
Okudaira, S.4
-
17
-
-
0000088991
-
-
C.R. Eddy, Jr., D. Leonhardt, S.R. Douglass, V.A. Shamamian, B.D. Thoms, and J.E. Butler, J. Vac. Sci. Technol. A 17, 780 (1999).
-
(1999)
J. Vac. Sci. Technol. A
, vol.17
, pp. 780
-
-
Eddy Jr., C.R.1
Leonhardt, D.2
Douglass, S.R.3
Shamamian, V.A.4
Thoms, B.D.5
Butler, J.E.6
-
19
-
-
0003400640
-
-
New York: John Wiley & Sons
-
B. Chapman, Glow Discharge Process (New York: John Wiley & Sons, 1980), pp. 49-76.
-
(1980)
Glow Discharge Process
, pp. 49-76
-
-
Chapman, B.1
|