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Volumn 34, Issue 6, 2005, Pages 733-739

A Langmuir probe investigation of electron cyclotron resonance argon-hydrogen plasmas

Author keywords

Electron cyclotron resonance (ECR); Langmuir probe

Indexed keywords

ARGON; CARRIER CONCENTRATION; CONCENTRATION (PROCESS); ELECTRON CYCLOTRON RESONANCE; HYDROGEN; IONIZATION; SUBSTRATES; VELOCITY MEASUREMENT;

EID: 21644447368     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-005-0012-x     Document Type: Conference Paper
Times cited : (16)

References (21)
  • 10
    • 0003955602 scopus 로고    scopus 로고
    • Cambridge, United Kingdom: Cambridge University Press
    • M. Elwenspoek and H.V. Jansen, Silicon Micromachining (Cambridge, United Kingdom: Cambridge University Press, 1998), pp. 212-233.
    • (1998) Silicon Micromachining , pp. 212-233
    • Elwenspoek, M.1    Jansen, H.V.2
  • 12
    • 21644489128 scopus 로고    scopus 로고
    • New York: Kluwer Academic/Plenum Publishers
    • Francis F. Chen and Jane P. Chang, Plasma Diagnostics (New York: Kluwer Academic/Plenum Publishers, 2003), pp. 75-97.
    • (2003) Plasma Diagnostics , pp. 75-97
    • Chen, F.F.1    Chang, J.P.2
  • 19
    • 0003400640 scopus 로고
    • New York: John Wiley & Sons
    • B. Chapman, Glow Discharge Process (New York: John Wiley & Sons, 1980), pp. 49-76.
    • (1980) Glow Discharge Process , pp. 49-76
    • Chapman, B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.