Self-organized metal networks at ion-etched Cu/Si and Ag/Si interfaces

Journal of Applied Physics

Volumn 97, Issue 8, 2005, Pages

  Stepanova, M ^a   Dew, S K ^a   Karpuzov, D S ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ION ENERGY; KINETIC MODEL; METAL CLUSTERS; METAL NETWORKS;

COMPUTER SIMULATION; COPPER; ELECTRODEPOSITION; ETCHING; INTERFACES (MATERIALS); IONS; SCANNING ELECTRON MICROSCOPY; SILICON; SILVER; TEMPERATURE DISTRIBUTION; X RAY PHOTOELECTRON SPECTROSCOPY;

METAL ANALYSIS;

EID: 21444449543     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1868855     Document Type: Article

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