Surface relaxation in ion-etch nanopatterning

Applied Physics Letters

Volumn 84, Issue 8, 2004, Pages 1374-1376

  Stepanova, M ^a   Dew, S K ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; BOUNDARY CONDITIONS; COMPUTER SIMULATION; DEPOSITION; DIFFUSION; MATHEMATICAL MODELS; MORPHOLOGY; REACTIVE ION ETCHING; SPUTTERING; SURFACE TENSION; WHITE ACOUSTIC NOISE;

EFFECTIVE TRANSPORT COEFFICIENT; SPATIAL DISTRIBUTIONS;

RELAXATION PROCESSES;

EID: 1642325151     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1650546     Document Type: Article

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