Reactive ion etching of CVD-diamond for piezoresistive pressure sensors

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 841-844

  Otterbach, R ^a   Hilleringmann, U ^a  

^a UNIVERSITY OF PADERBORN   (Germany)

Author keywords

Piezoresistance; Pressure sensor; Reactive ion etching; RIE

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FABRICATION; REACTIVE ION ETCHING; SENSORS;

ETCHING RATES;

DIAMONDS;

PIEZOELECTRICITY;

EID: 0036508408     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00703-8     Document Type: Article

References (14)

1. High rate CVD-diamond etching for high temperature pressure sensor applications