Precision micromachining of CVD diamond films

Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 1154-1158

  Park, J K ^a   Ayres, V M ^a   Asmussen, J ^a   Mukherjee, K ^a  

^a Michigan State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRONIC PROPERTIES; EXCIMER LASERS; FREE ENERGY; LASER ABLATION; MICROMACHINING; MORPHOLOGY; PLASMA APPLICATIONS; PULSED LASER APPLICATIONS; QUENCHING;

PRECISION MICROMACHINING;

DIAMOND FILMS;

EID: 0033746988     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00222-3     Document Type: Article

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