In situ resistance measurements of epitaxial cobalt silicide nanowires on Si(110)

Applied Physics Letters

Volumn 86, Issue 23, 2005, Pages 1-3

  Okino, Hiroyuki ^a   Matsuda, Iwao ^a   Hobara, Rei ^a   Hosomura, Yoshikazu ^a   Hasegawa, Shuji ^a   Bennett, P A ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL FILMS; NANOWIRES (NW); ROOM TEMPERATURE; ZERO-BIAS RESISTANCE;

COBALT COMPOUNDS; ELECTRIC RESISTANCE; ELECTRIC RESISTANCE MEASUREMENT; ELECTRON TUNNELING; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SCHOTTKY BARRIER DIODES; SEMICONDUCTING FILMS;

NANOSTRUCTURED MATERIALS;

EID: 21244484682     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1948519     Document Type: Article

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