SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 4 B, 2005, Pages 2428-2432

Thermal stability and electrical properties of (La2O 3)1-x(Al2O3)x composite films

(6) Fujitsuka, Ryota a Sakashita, Mitsuo a Sakai, Akira a Ogawa, Masaki a Zaima, Shigeaki a Yasuda, Yukio b

a NAGOYA UNIVERSITY (Japan)

b KOCHI UNIVERSITY OF TECHNOLOGY (Japan)

Author keywords

Al 2O3; CET; Composite film; Dielectric constant; High k gate dielectric film; La2O3; Leakage current; Pulsed laser deposition

Indexed keywords

LEAKAGE CURRENTS; PERMITTIVITY; PULSED LASER DEPOSITION; RAPID THERMAL ANNEALING; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

AL2O3; COMPOSITE FILMS; HIGH-K GATE DIELECTRIC FILM; LA2O3;

DIELECTRIC FILMS;

EID: 21244469815 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.44.2428 Document Type: Conference Paper

Times cited : (20)

References (19)

1
- 79955891236
- International Technology Roadmap for Semiconductors 2003 Edition.
- International Technology Roadmap for Semiconductors 2003 Edition

2
- 0035872897
- G. D. Wilk, R. M. Wallace and J. M. Anthony: J. Appl. Phys. 89 (2001) 5243.
- (2001) J. Appl. Phys. , vol.89 , pp. 5243
- Wilk, G.D.¹ Wallace, R.M.² Anthony, J.M.³

3
- 0033712917
- A. Chin, Y. H. Wu, S. B. Chen, C. C. Liao and W. J. Chen: Symp. VLSI Tech. (2000) p. 16.
- (2000) Symp. VLSI Tech. , pp. 16
- Chin, A.¹ Wu, Y.H.² Chen, S.B.³ Liao, C.C.⁴ Chen, W.J.⁵

4
- 0034187380
- J. Robertson: J. Vac. Sci. & Technol. B 18 (2000) 1785.
- (2000) J. Vac. Sci. & Technol. B , vol.18 , pp. 1785
- Robertson, J.¹

5
- 0035796727
- S. Stemmer, J.-P. Maria and A. I. Kingon: Appl. Phys. Lett. 79 (2001) 102.
- (2001) Appl. Phys. Lett. , vol.79 , pp. 102
- Stemmer, S.¹ Maria, J.-P.² Kingon, A.I.³

6
- 0036564797
- X. Wu, D. Landheer, G. I. Sproule, T. Quance, M. J. Graham and G. A. Botton: J. Vac. Sci. & Technol. A 20 (2002) 1141.
- (2002) J. Vac. Sci. & Technol. A , vol.20 , pp. 1141
- Wu, X.¹ Landheer, D.² Sproule, G.I.³ Quance, T.⁴ Graham, M.J.⁵ Botton, G.A.⁶

7
- 0042882672
- J. H. Jun, D. J. Choi, K. H. Kim, K. Y. Oh and C. J. Hwang: Jpn. J. Appl. Phys. 42 (2003) 3519.
- (2003) Jpn. J. Appl. Phys. , vol.42 , pp. 3519
- Jun, J.H.¹ Choi, D.J.² Kim, K.H.³ Oh, K.Y.⁴ Hwang, C.J.⁵

8
- 0036544455
- H. Yamada, T. Shimizu and E. Suzuki: Jpn. J. Appl. Phys. 41 (2002) L368.
- (2002) Jpn. J. Appl. Phys. , vol.41
- Yamada, H.¹ Shimizu, T.² Suzuki, E.³

9
- 0037444935
- P. F. Lee, J. Y. Dai, K. H. Wong, H. L. W. Chan and C. L. Choy: J. Appl. Phys. 93 (2003) 3665.
- (2003) J. Appl. Phys. , vol.93 , pp. 3665
- Lee, P.F.¹ Dai, J.Y.² Wong, K.H.³ Chan, H.L.W.⁴ Choy, C.L.⁵

10
- 79956027667
- H. Y. Yu, N. Wu, M. F. Li, C. Zhu, B. J. Cho, D.-L. Kwong, C. H. Tung, J. S. Pan, J. W. Chai, W. D. Wang, D. Z. Chi, C. H. Ang, J. Z. Zheng and S. Ramanathan: Appl. Phys. Lett. 81 (2002) 3618.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 3618
- Yu, H.Y.¹ Wu, N.² Li, M.F.³ Zhu, C.⁴ Cho, B.J.⁵ Kwong, D.-L.⁶ Tung, C.H.⁷ Pan, J.S.⁸ Chai, J.W.⁹ Wang, W.D.¹⁰ Chi, D.Z.¹¹ Ang, C.H.¹² Zheng, J.Z.¹³ Ramanathan, S.¹⁴

11
- 0001459736
- [in Japanese]
- M. Mizuno, R. Berjoan, J.-P. Coutures and M. Foex: Yogyo-Kyokai-Shi 82 (1974) 631 [in Japanese].
- (1974) Yogyo-Kyokai-Shi , vol.82 , pp. 631
- Mizuno, M.¹ Berjoan, R.² Coutures, J.-P.³ Foex, M.⁴

12
- 2342618734
- X. B. Lu, X. Zhang, R. Huang, H. B. Lu, Z. H. Chen, W. F. Xiang, M. He, B. L. Cheng, H. W. Zhou, X. P. Wang, C. Z. Wang and B. Y. Nguyen: Appl. Phys. Lett. 84 (2004) 2620.
- (2004) Appl. Phys. Lett. , vol.84 , pp. 2620
- Lu, X.B.¹ Zhang, X.² Huang, R.³ Lu, H.B.⁴ Chen, Z.H.⁵ Xiang, W.F.⁶ He, M.⁷ Cheng, B.L.⁸ Zhou, H.W.⁹ Wang, X.P.¹⁰ Wang, C.Z.¹¹ Nguyen, B.Y.¹²

13
- 0037463304
- B.-E. Park and H. Ishiwara: Appl. Phys. Lett. 82 (2003) 1197.
- (2003) Appl. Phys. Lett. , vol.82 , pp. 1197
- Park, B.-E.¹ Ishiwara, H.²

14
- 0042267252
- X.-B. Lu, Z.-G. Liu, Y.-P. Wang, Y. Yang, X.-P. Wang, H.-W. Zhou and B.-Y. Nguyen: J. Appl. Phys. 94 (2003) 1229.
- (2003) J. Appl. Phys. , vol.94 , pp. 1229
- Lu, X.-B.¹ Liu, Z.-G.² Wang, Y.-P.³ Yang, Y.⁴ Wang, X.-P.⁵ Zhou, H.-W.⁶ Nguyen, B.-Y.⁷

15
- 1242308912
- L. F. Edge, D. G. Schlom, S. A. Chambers, E. Cicerrella, J. L. Freeouf, B. Holländer and J. Schubert: Appl. Phys. Lett. 84 (2004) 726.
- (2004) Appl. Phys. Lett. , vol.84 , pp. 726
- Edge, L.F.¹ Schlom, D.G.² Chambers, S.A.³ Cicerrella, E.⁴ Freeouf, J.L.⁵ Holländer, B.⁶ Schubert, J.⁷

16
- 3042777685
- K. Honda, A. Sakai, M. Sakashita, H. Ikeda, S. Zaima and Y. Yasuda: Jpn. J. Appl. Phys. 43 (2004) 1571.
- (2004) Jpn. J. Appl. Phys. , vol.43 , pp. 1571
- Honda, K.¹ Sakai, A.² Sakashita, M.³ Ikeda, H.⁴ Zaima, S.⁵ Yasuda, Y.⁶

17
- 0037320225
- T. Gougousi, M. J. Kelly, D. B. Terry and G. N. Parsons: J. Appl. Phys. 93 (2003) 1691.
- (2003) J. Appl. Phys. , vol.93 , pp. 1691
- Gougousi, T.¹ Kelly, M.J.² Terry, D.B.³ Parsons, G.N.⁴

18
- 79955987445
- B. K. Park, J. Park, M. Cho, C. S. Hwang, K. Oh, Y. Han and D. Y. Yang: Appl. Phys. Lett. 80 (2002) 2368.
- (2002) Appl. Phys. Lett. , vol.80 , pp. 2368
- Park, B.K.¹ Park, J.² Cho, M.³ Hwang, C.S.⁴ Oh, K.⁵ Han, Y.⁶ Yang, D.Y.⁷

19
- 33845333064
- P. Masson, J.-L. Autran, M. Houssa, X. Garros and C. Leroux: Appl. Phys. Lett. 81 (2002) 3392.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 3392
- Masson, P.¹ Autran, J.-L.² Houssa, M.³ Garros, X.⁴ Leroux, C.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.