Study of integrated RF passive components performed using CMOS and Si micromachining technologies

Journal of Micromechanics and Microengineering

Volumn 7, Issue 3, 1997, Pages 162-164

  Lopez Villegas J M ^a   Samitier, J ^a   Bausells, J ^b   Merlost, A ^b   Cane C ^b   Knochel R ^c  

^a UNIVERSITY OF BARCELONA   (Spain)

^b INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^c UNIVERSITY OF KIEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; MICROMACHINING; NATURAL FREQUENCIES; SEMICONDUCTING SILICON;

INTEGRATED RADIO FREQUENCY PASSIVE COMPONENTS;

MICROELECTROMECHANICAL DEVICES;

EID: 0031222568     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/7/3/022     Document Type: Article

References (5)

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2. Nguyen N M and Meyer R G 1990 IEEE J. Solid-State Circuits 25 1028-31
3. Chang J Y C, Abidi A A and Gaitan M 1993 IEEE Electron Dev. Lett. 14 246-8
4. Chi C Y and Rebeiz G M 1995 IEEE Trans. Microwave Theory Technol. 43 730-8
5. Rofougaran A, Chang J C, Rofougaran M and Abidi A A 1996 IEEE J. Solid-State Circuits 31 880-9