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Applied Physics Letters

Volumn 86, Issue 6, 2005, Pages 1-3

Nanometer-scale gaps between metallic electrodes fabricated using a statistical alignment technique

(2) Steinmann, P a Weaver, J M R a

a UNIVERSITY OF GLASGOW (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTANCE; ELECTRON BEAM LITHOGRAPHY; EVAPORATION; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; STATISTICAL METHODS;

ANALYTICAL MODEL; MACROSCOPIC ELECTRODES; METALLIC ELECTRODES; NANOMETER-SCALE GAPS;

ELECTRODES;

EID: 21044435677 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1862342 Document Type: Article

Times cited : (20)

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