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Volumn 21, Issue 5, 2003, Pages 2138-2141

Fabrication of metallic tunnel junctions for the scanning single electron transistor atomic force microscope

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COULOMB BLOCKADE; ELECTRON BEAM LITHOGRAPHY; GRAIN GROWTH; PHOTOLITHOGRAPHY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; THERMODYNAMIC STABILITY;

EID: 0242677560     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1612931     Document Type: Article
Times cited : (6)

References (19)
  • 17
    • 0242565029 scopus 로고    scopus 로고
    • GmbH: U.S. Patent ANo. 5,501,893
    • F. Laermer, A. Schilp, and R. Bosch, GmbH: U.S. Patent ANo. 5,501,893, 1996.
    • (1996)
    • Laermer, F.1    Schilp, A.2    Bosch, R.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.