Three-component photoresists based on thermal crosslinking and acidolytic cleavage

Polymer

Volumn 41, Issue 11, 2000, Pages 4013-4019

  Moon, S Y ^a   Chung, C M ^b   Yamaoka, T ^c  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Yonsei University Wonju   (South Korea)

^c CHIBA UNIVERSITY   (Japan)

Author keywords

Photoresist; Thermal crosslinking; Vinyl ether group

Indexed keywords

ACIDS; BINDERS; CATALYSIS; CROSSLINKING; DISSOLUTION; INFRARED SPECTROSCOPY; PHOTORESISTS; POLYSTYRENES; SOLUBILITY; SYNTHESIS (CHEMICAL); THERMAL EFFECTS; ULTRAVIOLET RADIATION;

ACIDOLYTIC CLEAVAGE; PHOTOGENERATED ACID; SOLUBILIZATION; THERMAL CROSSLINKING; THREE COMPONENT PHOTORESISTS; VINYL ETHER MONOMERS;

MONOMERS;

BENZENE DERIVATIVE; ETHANE;

ALKALINITY; AQUEOUS SOLUTION; ARTICLE; CATALYSIS; CHEMICAL STRUCTURE; CROSS LINKING; PHOTOCHEMISTRY; PHOTOSENSITIVITY; SOLUBILITY; TEMPERATURE DEPENDENCE; ULTRAVIOLET RADIATION;

EID: 0342288636     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(99)00623-0     Document Type: Article

References (30)

1. Ito H, Willson CG. Technical Papers of SPE Regional Technical Conference on Photopolymers, p. 331, 1982.
2. Frechet J.M.J., Ito H., Willson C.G. Proc Microcircuit Eng. 1982;260.
3. Yamaoka T., Nishiki M., Koseki K. Polym Eng Sci. 29:1989;856.
4. Hayashi N., Ueno T., Hesp M., Toriumi M., Iwayanagi T. Polymer. 33:1992;1583.
5. Ito H., Ueda M. Macromolecules. 23:1990;2885.
6. Ito H., Ueda M. J Photopolym Sci Technol. 3:1990;335.
7. Frechet J.M.J., Eichler E., Ito H., Willson C.G. Polymer. 24:1983;995.
8. Frechet J.M.J., Tessier T.G., Willson C.G., Ito H. Macromolecules. 18:1985;317.
9. Pawlowski G., Przybilla K.J., Spiess W., Wengenroth H., Roschert H. J Photopolym Sci Technol. 5:1992;55.
10. Willson C.G., Ito H., Frechet J.M.J., Tessier T.G., Houlihan F.M. J Electrochem Soc. 133:1986;181.
11. Frechet J.M.J., Bouchard F., Eichler E., Houlihan F.M., Iizawa T., Kryczka B., Willson C.G. Polym J. 19:1987;31.
12. Ito H., Ueda M., Schwalm R. J Vac Sci Technol. B6:1988;2259.
13. Frechet J.M.J., Houlihan F.M., Willson C.G. Proc ACS Div Polym Mater Sci Engng. 53:1985;268.
14. Houlihan F.M., Bouchard F., Frechet J.M.J., Willson C.G. Macromolecules. 19:1986;13.
15. Frechet J.M.J., Stanciulescu M., Iizawa T., Willson C.G. Proc ACS Div Polym Mater Sci Eng. 60:1989;170.
16. Yiang J., Frechet J.M.J. Macromolecules. 24:1991;3528.
17. Reck B., Allen R.D., Twieg R.J., Willson C.G., Matuszczak S., Stover H.D.H., Li N.H., Frechet J.M.J. Polym Eng Sci. 29:1989;960.
18. Frechet J.M.J., Matuszczak S., Reck B., Tessier T.G., Stover H.D.H., Willson C.G. Macromolecules. 24:1991;1746.
19. Thackeray J.W., Orsula G.W., Rajaratnam M.M., Sinta R., Herr D. Proc SPIE. 1466:1991;39.
20. Fahey J.T., Shimizu K., Frechet J.M.J., Clecak N., Willson C.G. J Polym Sci, Polym Chem Ed. 31:1993;1.
21. Frechet J.M.J., Kryczka B., Matuszczak S., Reck B., Stanciulescu M., Wilson C.G. J Photopolym Sci Technol. 3:1990;235.
22. Kumada T., Kubota S., Koezuka H., Hanawa T., Kishimura S., Nagata H. J Photopolym Sci Technol. 4:1991;469.
23. Thompson L.F., Feit E.D. Heidenreich. Polym Eng Sci. 14:1974;529.
24. Hoyle C.E., Keel M., Kim K.J. Polymer. 29:1988;18.
25. Moon S., Naitoh K., Yamaoka T. Chem Mater. 5:1993;1315.
26. Moon S., Kamenosono K., Kondo S., Umehara A., Yamaoka T. Chem Mater. 6:1994;1854.
27. Yamaoka T., Adachi H., Matsumoto K., Watanabe H., Shirosaki T. J Chem Soc, Perkin Trans. 2:1990;1709.
28. Naitoh K., Yamaoka T., Umehara A. Chem Lett. 1991;1869.
29. Naitoh K., Yamaoka T., Umehara A. Polym Advan Technol. 3:1992;117.
30. Moon S., Koo J., Oh S., Lee S., Park D. Proceedings of 11th international technical conference on photopolymers. 1997;112 Society of Plastics Engineers Inc, New York.