Phase transition and microstructure change in Ta-Zr alloy films by co-sputtering

Surface and Coatings Technology

Volumn 198, Issue 1-3 SPEC. ISS., 2005, Pages 110-113

  Tang, Z Z ^a   Hsieh, J H ^a   Zhang, S Y ^a   Li, C ^a   Fu, Y Q ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Amorphization; Co sputtering; Ta Zr

Indexed keywords

MICROSTRUCTURE; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; SILICON; SPUTTERING; TANTALUM ALLOYS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CO-SPUTTERING; SUBSTRATE BIAS; TA-ZR ALLOY FILMS;

THIN FILMS;

COATING;

EID: 20744441852     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.10.019     Document Type: Article

References (14)

1. D. Fischer T. Scherg J.G. Bauer H.-J. Schulze C. Wenzel Microelectron. Eng. 50 2001 459
2. S. Bystrova J. Holleman P.H. Woerlee Microelectron. Eng. 55 2001 189
3. Jin-Tae No O. Jun-Hwan Chongmu Lee Mater. Chem. Phys. 63 2000 44
4. O. Jin B.X. Liu J. Non-Cryst. Solids 211 1997 180
5. H. Hecht G. Weigang S. Eichert U. Geyer Z. Phys., B 100 1996 47
6. G.B. Thompson R. Banerjee S.A. Dregia H.L. Fraser Acta Mater. 51 2003 5285
7. G.S. Chen S.T. Chen S.C. Huang H.Y. Lee Appl. Surf. Sci. 169 2001 353
8. M.E. Day M. Delfino J.A. Fair W. Tsai Thin Solid Films 254 1995 285
9. J.H. Hsieh C. Li W. Wu R.F. Hochman Thin Solid Films 424 2003 103
10. G. Shao P. Tsakiropoulos Mater. Sci. Eng., A Struct. Mater.: Prop. Microstruct. Process. 375 2004 556
11. C. Michaelsen C. Gente R. Bormann J. Appl. Phys. 81 1997 6024
12. B. Cantor R.W. Cahn Acta Met. 24 1976 845
13. S.Z. Wang G. Shao P. Tsakiropoulos F. Wang Mater. Sci. Eng., A Struct. Mater.: Prop. Microstruct. Process. 329 2002 141
14. J.H. Hsieh C. Li C.M. Wang Y.C. Liu Z.Z. Tang J. Metastable Nanocryst. Mater. 23 2004 211