Near-amorphous alloy thin films by co-sputtering deposition

Journal of Metastable and Nanocrystalline Materials

Volumn 23, Issue , 2005, Pages 211-214

  Hsieh, J H ^a   Li, C ^a   Wang, C M ^a   Liu, Y C ^b   Tang, Z Z ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

Amorphization; Co Sputtering; Nb Cr; Nb Ti; Ta Cr; Zr Cr

Indexed keywords

AMORPHIZATION; BOUNDARY LAYERS; NITRIDES; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CO-SPUTTERING DEPOSITION; NEAR-AMORPHOUS ALLOYS; NITRIDE PHASES; VACUUM CHAMBERS;

AMORPHOUS ALLOYS;

EID: 12344275312     PISSN: 14226375     EISSN: None     Source Type: Journal    
DOI: 10.4028/www.scientific.net/JMNM.23.211     Document Type: Conference Paper

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