Chemical and interface effects on glass forming ability under ion mixing in Zr-Ta system of positive heat of formation

Journal of Non-Crystalline Solids

Volumn 211, Issue 1-2, 1997, Pages 180-186

  Jin, O ^a,b   Liu, B X ^a,b  

^a TSINGHUA UNIVERSITY   (China)

^b CCAST WORLD LABORATORY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; AMORPHOUS ALLOYS; BINARY ALLOYS; CRYSTALLINE MATERIALS; FREE ENERGY; INTERFACES (MATERIALS); PHASE DIAGRAMS; TANTALUM ALLOYS; THERMAL EFFECTS; ZIRCONIUM ALLOYS;

FREE ENERGY DIAGRAMS; HEAT OF FORMATION;

AMORPHOUS FILMS;

EID: 0031125043     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(96)00576-5     Document Type: Article

References (21)

1. W. Buckel and R. Hilsch, Z. Phys. 138 (1954) 109.
2. P. Duwez, R.H. Willens and W. Klement, J. Appl. Phys. 31 (1960) 1136.
3. B.X. Lith, Phys. Status Solidi A 94 (1986) 11.
4. J.A. Alonso and S. Simozar, Solid State Commun. 48 (1983) 765.
5. A.R. Miedema, A.K. Niessen, F.R. de Boer, R. Boom and W.C.M. Mattens, Cohesion in Metals: Transition Metal Alloys (North-Holland, Amsterdam, 1989).
6. B.X. Liu, Mater. Lett. 5 (1987) 322.
7. L.J. Huang and B.X. Liu, Nucl. Instr. Meth. Phys. Res. B 18 (1987) 256.
8. O. Jin and B.X. Liu, J. Phys. Condens. Matter 6 (1994) L39.
9. Z.J. Zhang, H.Y. Bai, Q.L. Qiu, T. Yang, K. Tao and B.X. Liu, J. Appl. Phys. 73 (1993) 1702.
10. O. Jin, Z.J. Zhang and B.X. Liu, J. Appl. Phys 78 (1995) 149.
11. J.A. Alonso, L.J. Gallego and J.A. Simozar, Nuovo Cimento 12 (1990) 587.
12. Z.J. Zhang and B.X. Liu, Phys. Rev. B 51 (1995) 16475.
13. A.K. Niessen, A.R. Miedema, F.R. de Boer and R. Boom, Physica B 151 (1988) 401.
14. J. Gerkema and A.R. Miedema, Surf. Sci. 124 (1981) 351.
15. D. Turbull, in: Impurities and Imperfections, Am. Soc. Met. Ohio 121 (1955).
16. L.E. Murr, in: Interfacial Phenomena in Metals and Alloys (Addison-Wesley, London, 1975).
17. A.R. Miedema, Z. Metallkd. 69 (1978) 455.
18. A.R. Miedema, Z. Metallkd. 69 (1978) 287.
19. F.Z. Cui, Y.D. Fan, Y. Wang, A.M. Vredenberg, H.J.G. Draaisma and R. Xu, J. Appl. Phys. 68 (1990) 701.
20. Z.J. Zhang, O. Jin and B.X. Liu, Phys. Rev. B 51 (1995) 8076.
21. Z.J. Zhang and B.X. Liu, J. Appl. Phys. 75 (1994) 3847.