Low-impedance internal linear inductive antenna for large-area flat panel display plasma processing

Journal of Applied Physics

Volumn 97, Issue 6, 2005, Pages

  Kim, K N ^a   Jung, S J ^a   Lee, Y J ^a   Yeom, G Y ^a   Lee, S H ^b   Lee, J K ^b  

^a Sungkyunkwan University   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

LINEAR INDUCTIVE ANTENNAS; PROCESS CHAMBER; SERPENTINE-TYPE ANTENNAS; STANDING-WAVE EFFECT;

DIELECTRIC MATERIALS; FLAT PANEL DISPLAYS; INDUCTIVELY COUPLED PLASMA; LIQUID CRYSTAL DISPLAYS; PLASMAS; SUBSTRATES;

ANTENNAS;

EID: 20444496495     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1861136     Document Type: Article

References (14)

1. J. Holland, M. Barnes, A. Demos, T. Ni, P. Shufflebotham, and W. Yao, SID Int. Symp. Digest Tech. Papers 27, 526 (1996).
2. F. Heinrich, U. Banzlger, A. Jentzsch, G. Neumann, and C. Huth, J. Vac. Sci. Technol. B 14, 2000 (1996).
3. H. Takei, H. Kawamura, Y. Ohta, and R. Gardner, SID 98 Digest, 1998, p. 1102.
4. J. Schmitt, M. Elyaakoubi, and L. Sansonnens, Plasma Sources Sci. Technol. 11, A206 (2002).
5. W. Z. Collison, T. Q. Ni, and M. S. Barnes, J. Vac. Sci. Technol. A 16, 100 (1998).
6. S. S. Kim, H. Y. Chang, C. S. Chang, and N. S. Yoon, Appl. Phys. Lett. 77, 492 (2000).
7. Z. Yu, D. Shaw, P. Gonzales, and G. J. Collins, J. Vac. Sci. Technol. A 13, 503 (1995).
8. J. H. Kim, H. J. Lee, Y. T. Kim, J. H. Joo, and K. W. Whang, J. Vac. Sci. Technol. A 15, 564 (1997).
9. T. Meziani, P. Colpo, and F. Rossi, Plasma Sources Sci. Technol. 10, 276 (2001).
10. K. Suzuki, K. Nakamura, H. Ohkubo, and H. Sugai, Plasma Sources Sci. Technol. 7, 13 (1998).
11. Y. Wu and M. A. Lieberman, Appl. Phys. Lett. 72, 777 (1998).
12. M. Kanoh, K. Suzuki, J. Tonotani, K. Aoki, and M. Yamage, Jpn. J. Appl. Phys., Part 1 40, 5419 (2001).
13. K. N. Kim, Y. J. Lee, S. J. Jung, and G. Y. Yeom, Jpn. J. Appl. Phys., Part 1 43, 4373 (2004).
14. Y. Wu and M. A. Lieberman, Plasma Sources Sci. Technol. 9, 210 (2000).