Effects of the axial external magnetic field on the reduction of the dielectric window damage due to capacitive coupling in the inductively coupled plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 564-567

  Kim, Jung Hun ^a   Lee, Ho Jun ^a   Kim, Youn Taeg ^a   Whang, Ki Woong ^a   Joo, Jung Hoon ^b  

^a Seoul National University   (South Korea)

^b Kunsan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343761179     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580684     Document Type: Article

References (15)

1. G. S. Oehrlein, Y. Zhang, D. Vender, and M. Haverlag, J. Vac. Sci. Technol. A 12, 323 (1994).
2. H. H. Doh, J. H. Kim, K. W. Whang, and S. H. Lee, J. Vac. Sci. Technol. A 14, 1088 (1996).
3. D. L. Pappas and J. Hopwood, J. Vac. Sci. Technol. A 12, 1576 (1994).
4. Y. Horiike, K. Kubota, H. Shindo, and T. Fukasawa, J. Vac. Sci. Technol. A 13, 801 (1995).
5. S. Samukawa, Y. Suzuki, and M. Sasaki, Appl. Phys. Lett. 57, 403 (1990).
6. R. Patrick, P. Schoenborn, H. Toda, and F. Bose, J. Vac. Sci. Technol. A 11, 1296 (1993).
7. H. J. Lee, J. H. Kim, J. H. Joo, and K. W. Whang, J. Vac. Sci. Technol. A 14, 1007 (1996).
8. J. Hopwood, Plasma Sources Sci. Technol. 3, 460 (1994).
9. Y. Hikosaka, M. Nakamura, and H. Sugai, Jpn. J. Appl. Phys. 33, 2157 (1994).
10. H. Sugai, K. Nakamura, and K. Suzuki, Jpn. J. Appl. Phys. 33, 2189 (1994).
11. J. Hopwood, Plasma Sources Sci. Technol. 1, 109 (1992).
12. D. F. Beale, A. E. Wendt, and L. J. Mahoney, J. Vac. Sci. Technol. A 12, 2775 (1994).
13. H. J. Lee, I. D. Yang, and K. W. Whang, Plasma Sources Sci. Technol. 5, 383 (1996).
14. J. E. Stevens, M. J. Sowa, and J. L. Cecchi, J. Vac. Sci. Technol. A 13, 2476 (1995).
15. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).