Effect of boron doping on the electron-field-emission properties of nanodiamond films

Journal of Applied Physics

Volumn 97, Issue 5, 2005, Pages

  Lee, Yen Chih ^a   Lin, Su Jien ^a   Lin, I Nan ^b   Cheng, Hsiu Fung ^c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b TAMKANG UNIVERSITY   (Taiwan)

^c NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS-ENHANCED NUCLEATION (BEN); BORON DOPING; ELECTRON-FIELD-EMISSIONS (EFE); NANODIAMOND FILMS;

BORON; CRYSTAL STRUCTURE; DIAMOND FILMS; ELECTRON EMISSION; GRAIN BOUNDARIES; NANOSTRUCTURED MATERIALS; NUCLEATION;

DOPING (ADDITIVES);

EID: 20444452460     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1852068     Document Type: Article

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