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Volumn 234, Issue 4, 2005, Pages 487-493
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Molecular-dynamics simulation of germanium film growth by cluster deposition
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Author keywords
Cluster deposition; Ge films; Molecular dynamics simulation; Stillinger Weber potential; Stress
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Indexed keywords
AMORPHOUS MATERIALS;
COMPUTER SIMULATION;
CRYSTALLINE MATERIALS;
DEPOSITION;
EQUATIONS OF MOTION;
FILM GROWTH;
METALLIC FILMS;
MOLECULAR DYNAMICS;
NANOSTRUCTURED MATERIALS;
SILICON;
STRESS CONCENTRATION;
SUBSTRATES;
CLUSTER DEPOSITION;
GE FILMS;
MOLECULAR-DYNAMICS SIMULATION;
STILLINGER-WEBER POTENTIAL;
STRESS;
GERMANIUM;
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EID: 20344394132
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2005.03.001 Document Type: Article |
Times cited : (6)
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References (21)
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