Fluid pressures and pad topography in chemical mechanical polishing

Journal of the Electrochemical Society

Volumn 152, Issue 5, 2005, Pages

  Borucki, Leonard J ^a   Ng, Sum Huan ^b   Danyluk, Steven ^b  

^a Intelligent Planar   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASION; CHEMICAL POLISHING; DEFORMATION; HYDRODYNAMICS; POLYURETHANES; PRESSURE DISTRIBUTION; STRAIN MEASUREMENT; SURFACES;

FLUID PRESSURES; MECHANICAL POLISHING; PAD TOPOGRAPHY; PRESSURE REGIONS;

SURFACE TOPOGRAPHY;

EID: 20344392665     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1890765     Document Type: Article

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