Mechanical Modeling of the 2D Interfacial Slurry Pressure in CMP

Materials Research Society Symposium - Proceedings

Volumn 767, Issue , 2003, Pages 305-312

  Fred Higgs III, C ^a   Ng, Sum Huan ^a   Yoon, Inho ^a   Shan, Lei ^b   Yap, Lipkong ^a   Danyluk, Steven ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FINITE ELEMENT METHOD; FLOW OF FLUIDS; INTERFACES (MATERIALS); PRESSURE MEASUREMENT; SILICON WAFERS; SLURRIES;

CONTACT PRESSURE;

CHEMICAL MECHANICAL POLISHING;

EID: 0242322610     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)

1. Levert, J., S. Danyluk, and J. Tichy, Mechanism for subambient interfacial pressures while polishing with liquids. Journal of Tribology, 2000. 122: p. 450.
2. Levert, J., Baker, A., Mess, F., Danyluk, S., Salant, R., and Cook, L., Slurry Film Measurements for Chemical Mechanical Polishing. Proc. of the Am. Soc. of Precision Engineering, 1996. 14: p. 80-85.
3. Shan, L., Levert, J., Meade, L., Tichy, J., Danyluk, S., Interfacial Fluid Mechanics and Pressure Prediction in Chemical Mechanical Polishing. Journal of Tribology, 2000. 122: p. 539-543.
4. Greenwood, J.A. and J.B. Williamson, Contact of Nominally Flat Rough Surfaces. Proc. Royal Society of London, 1966. A295: p. 300-319.
5. Shan, L., Mechanical interactions at the interface of chemical mechanical polishing. 2000, Ph.D. Thesis, Georgia Institute of Technology: Atlanta.
6. Kim, A., Seok, J., Sukam, C., Tichy, J., Cale, T. Multiscale material removal modeling of chemical mechanical polishing, in Adv. Metallization Conf. 2001.
7. Streator, J. A Model of Mixed Lubrication with Capillary Effects. in Proceedings of the 28th Leeds-Lyon Symposium on Tribology-Boundary and Mixed Lubrication: Science and Applications. 2001. Leeds, England.
8. Johnson, K.L., Contact Mechanics. 1985, Cambridge, UK: Cambridge University Press.
9. Hamrock, B.J., Fundamentals of Fluid Film Lubrication. 1994: McGraw-Hill.
10. Patir, N. and H. Cheng, An Average Flow Model for Determining Effects of Three-Dimensional Roughness on Partial Hydrodynamic Lubrication. ASME J. Lubrication Technology. 1978. Vol. 100(1): p. 12-17.
11. Higgs III, C., Ng, S.H., Yoon, I., Yap, L., and S. Danyluk. Predicting the Hydrodynamic Slurry Pressure in CMP: Modeling and Experiments. In Preparation for the Journal of Tribology, 2003.