Low energy sputtering of nickel by normally incident xenon ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 234, Issue 4, 2005, Pages 441-457

  Zhou, X W ^a   Wadley, H N G ^a   Sainathan, S ^a  

^a University of Virginia   (United States)

Author keywords

Molecular dynamics; Sputtering

Indexed keywords

COMPUTER SIMULATION; DIELECTRIC MATERIALS; GIANT MAGNETORESISTANCE; ION BEAM ASSISTED DEPOSITION; KINETIC ENERGY; MAGNETORESISTANCE; MOLECULAR BEAM EPITAXY; MOLECULAR DYNAMICS; POSITIVE IONS; SPUTTER DEPOSITION; SPUTTERING; SUPERLATTICES; X RAY OPTICS; XENON;

ATOMISTIC SIMULATIONS; ION BEAM DEPOSITION (IBD); LOW ENERGY SPUTTERING; MOLECULAR DYNAMICS SIMULATION;

NICKEL;

EID: 20344366297     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.02.016     Document Type: Article

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