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Volumn 18, Issue 1, 2000, Pages 37-41
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Biased target deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
COPPER;
ELECTRIC CONDUCTIVITY MEASUREMENT;
ELECTRON EMISSION;
ELECTRON SOURCES;
FILM PREPARATION;
ION BEAMS;
ION SOURCES;
SPUTTERING;
THICKNESS MEASUREMENT;
THIN FILMS;
BIASED TARGET DEPOSITION APPARATUS;
LOW ENERGY ION SOURCE;
MAGNETORESISTIVE DEVICES;
DEPOSITION;
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EID: 0033708050
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.582155 Document Type: Article |
Times cited : (49)
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References (2)
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