Optimization of giant magnetoresistance in ion beam sputtered Co/Cu multilayers

Journal of Magnetism and Magnetic Materials

Volumn 166, Issue 3, 1997, Pages 267-276

  Schmeusser, S ^a   Rupp, G ^b   Hubert, A ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b SIEMENS AG   (Germany)

Author keywords

Co Cu multilayers; Exchange coupling; Giant magnetoresistance; Interface structure; Ion beam sputtering; Thin film growth

Indexed keywords

ANTIFERROMAGNETISM; ARGON; COBALT; COPPER; FILM GROWTH; INTERFACES (MATERIALS); ION BEAMS; MAGNETIC COUPLINGS; MULTILAYERS; SPUTTERING; XENON;

GIANT MAGNETORESISTANCE; ION BEAM SPUTTERING; PLASMA SPUTTERING;

MAGNETORESISTANCE;

EID: 0031546770     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(96)00609-9     Document Type: Article

References (21)

1. S.S.P. Parkin, Z.G. Li and D.J. Smith, Appl. Phys. Lett. 58 (1991) 2710.
2. G. Rupp and H.A.M. van den Berg, IEEE Trans. Magn. 29 (1993) 3102.
3. H. Kano, K. Kagawa, A. Suzuki, A. Okabe, K. Hayashi and K. Aso, Appl. Phys. Lett. 63 (1993) 2839.
4. Y. Saito, K. Inomata, A. Goto and H. Yasuoka, J. Magn. Magn. Mater. 126 (1993) 466.
5. N. Kataoka, K. Saito and H. Fujimori, J. Magn. Magn. Mater. 121 (1993) 383.
6. M.J. Hall, B.J. Hickey, M.A. Howson, M.J. Walker, J. Xu, D. Greig and N. Wiser, Phys. Rev. B 47 (1993) 12785.
7. Z.J. Yang and M.R. Scheinfein, Phys. Rev. B 52 (1995) 4263.
8. J.C.S. Kools, R. Coehoorn, F.J.G. Hakkens and R.H.J. Fastenau, J. Magn. Magn. Mater. 121 (1993) 83.
9. S.K.J. Lenczowski, C. Schönenberger, M.A.M. Gijs and WJ.M. de Jonge, J. Magn. Magn. Mater., to be published.
10. D. Weller, P. Schrijner and W. Reim, IEEE Trans. Magn. 24 (1988) 1731.
11. H.R. Kaufman, J.J. Cuomo and J.M.E. Harper, J. Vac. Sci. Technol. 21 (1982) 725.
12. G. Rupp and K. Schuster, J. Magn. Magn. Mater. 121 (1993) 416.
13. Y. Saito, K. Inomata, K. Yusu, A. Goto and H. Yasuoka, Phys. Rev. B 52 (1995) 6500.
14. R. Mattheis, W. Andrä, Jr., L. Fritzsch, A. Hubert, M. Rührig and F. Thrum, J. Magn. Magn. Mater. 121 (1993) 424.
15. E.E. Fullerton, I.K. Schuller, H. Vanderstraeten and Y. Bruynseraede, Phys. Rev. B 45 (1992) 9292.
16. J.H. Underwood and T.W. Barbee, Jr., Appl. Opt. 20 (1981) 3027.
17. T. Hamaguchi, H. Aida, S. Nakagawa and M. Naoe, J. Appl. Phys. 73 (1993) 6444.
18. W. Eckstein and J.P. Biersack, Z. Phys. B 63 (1986) 471.
19. Y. Saito, S. Hashimoto and K. Inomata, Appl. Phys. Lett. 60 (1992) 2436.
20. H.A.M. van den Berg and G. Rupp, IEEE Trans. Magn. 30 (1994) 809.
21. K. Kagawa, H. Kano, A. Okabe, A. Suzuki and K. Hayashi, J. Appl. Phys. 75 (1994) 6540.