Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5533, Issue , 2004, Pages 116-123

  Yamauchi, K ^a   Yamamura, K ^a   Mimura, H ^a   Sano, Y ^a   Matsuyama, S ^a   Yumoto, H ^a   Ueno, K ^a   Shibahara, M ^b   Endo, K ^a   Yabashi, M ^c   Tamasaku, K ^d   Nishino, Y ^d   Ishikawa, T ^c,d   Mori, Y ^a  

^a OSAKA UNIVERSITY   (Japan)

^b HYOGO PREFECTURAL INSTITUTE OF TECHNOLOGY   (Japan)

^c SPring 8/Japan Synchrt Radiat RI ^*  (Japan)

^d RIKEN SPring 8 Center   (Japan)

Author keywords

Coherent X ray; EEM (elastic emission machining); Hard X ray focusing; Microstitching interferomatory; Plasma CVM (chemical vaporization machining); Ultraprecision machining; X ray mirror

Indexed keywords

COHERENT LIGHT; CRYSTAL GROWTH; INTERFEROMETRY; NANOTECHNOLOGY; VAPORIZATION; X RAY OPTICS; X RAYS;

ADVANCED PHOTON SOURCES (APS); CHEMICAL VAPORIZATION MACHINING (CVM); ELASTIC EMISSION MACHINING (EEM); X-RAY MIRRORS;

MIRRORS;

EID: 20144378333     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.567501     Document Type: Conference Paper

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