Soft nanoimprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5645, Issue , 2005, Pages 283-288

  Chen, Y ^a,b   Roy, E ^a   Kanamori, Y ^a   Belotti, M ^a   Decanini, D ^a  

^a CNRS   (France)

^b ECOLE NORMALE SUPÉRIEURE   (France)

Author keywords

Molding pattern replication; Nanofabrication; Nanoimprint; Soft lithography; Soft stamps

Indexed keywords

NANOSTRUCTURED MATERIALS; NAVIER STOKES EQUATIONS; OPTOELECTRONIC DEVICES; PHOTOLITHOGRAPHY; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SPIN COATING; ULTRAVIOLET RADIATION;

MOLDING PATTERN REPLICATION; NANOIMPRINT; SOFT LITHOGRAPHY; SOFT STAMPS;

NANOTECHNOLOGY;

EID: 20044388586     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.570745     Document Type: Conference Paper

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