High fidelity blazed grating replication using nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3260-3264

  Chang, Chih Hao ^a   Montoya, J C ^a   Akilian, M ^a   Lapsa, A ^a   Heilmann, R K ^a   Schattenburg, M L ^a   Li, M ^b   Flanagan, K A ^a   Rasmussen, A P ^c   Seely, J F ^d   Laming, J M ^d   Kjornrattanawanich, B ^e   Goray, L I ^f  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Nanonex Corporation   (United States)

^c Och Spine at New York Presbyterian Hospitals   (United States)

^d NAVAL RESEARCH LABORATORY   (United States)

^e UNIVERSITIES SPACE RESEARCH ASSOCIATION   (United States)

^f Intl Intellectual Group Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLAZING; NANOIMPRINT LITHOGRAPHY (NIL); ULTRAVIOLET (UV) CURING; X-RAY TELESCOPES;

ATOMIC FORCE MICROSCOPY; CURING; ETCHING; LITHOGRAPHY; NANOTECHNOLOGY; PLASTIC FILMS; RESIDUAL STRESSES; SILICON WAFERS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

DIFFRACTION GRATINGS;

EID: 19944431752     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1809614     Document Type: Conference Paper

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