Four-inch photo-curable nanoimprint lithography using NX-2000 nanoimprintor

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 209-212

  Li, Mingtao ^a   Tan, Hua ^a   Kong, Linshu ^a   Koecher, Larry ^a  

^a Nanonex Corporation   (United States)

Author keywords

ACP; Air cushion press; Nanoimprintor; Nanonex; P NIL; Photo curable nanoimprint lithography

Indexed keywords

AIR CUSHIONING; GLASS TRANSITION; NANOSTRUCTURED MATERIALS; REACTIVE ION ETCHING; SUPERCONDUCTING TRANSITION TEMPERATURE; VISCOSITY;

AIR CUSHION PRESS (ACP); NANOIMPRINTOR; NANONEX; PHOTO-CURABLE NANOIMPRINT LITHOGRAPHY (P-NIL);

LITHOGRAPHY;

EID: 3843120886     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537232     Document Type: Conference Paper

References (2)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett, 67, 3114, 1995; Science 272, 85, 1996
2. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett, 67, 3114, 1995; Science 272, 85, 1996