Fabrication of sawtooth diffraction gratings using nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2755-2759

  Chang, Chih Hao ^a   Heilmann, R K ^a   Fleming, R C ^a   Carter, J ^a   Murphy, E ^a   Schattenburg, M L ^a   Bailey, T C ^b   Ekerdt, J G ^b   Frankel, R D ^c   Voisin, R ^d  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b The University of Texas at Austin   (United States)

^c Chromaplex Inc   (United States)

^d MOLECULAR IMPRINTS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; ASPECT RATIO; ATOMIC FORCE MICROSCOPY; FUSED SILICA; LIGHT REFLECTION; LITHOGRAPHY; OPTICAL TELESCOPES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

INTERFERENCE LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY (NIL); STEP-AND-FLASH IMPRINT LITHOGRAPHY (SFIL);

DIFFRACTION GRATINGS;

EID: 0942289223     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1627814     Document Type: Conference Paper

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