Structure and chemistry of SiOx (x < 2) systems

Vacuum

Volumn 67, Issue 3-4, 2002, Pages 491-499

  Barranco, A ^a   Yubero, F ^a   Espinos, J P ^a   Holgado, J P ^a   Caballero, A ^a   Gonzalez Elipe, A R ^a   Mejias, J A ^b  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b UNIVERSIDAD PABLO DE OLAVIDE   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); ION BEAMS; OXIDATION; SILICON COMPOUNDS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROSCOPY;

X RAY ABSORPTION SPECTROSCOPY;

QUANTUM THEORY;

EID: 0037179750     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00218-X     Document Type: Conference Paper

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