Reflectivity and stability of Cr/Sc multilayers for the soft X-ray range

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4782, Issue , 2002, Pages 285-291

  Yulin, Sergiy ^a   Kuhlmann, Thomas ^a   Feigl, Torsten ^a   Kaiser, Norbert ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Cr Sc; Multilayers; Reflectivity; Soft X rays; Thermal stability

Indexed keywords

INTERFACES (MATERIALS); MULTILAYERS; PHASE TRANSITIONS; SCANDIUM; SPUTTER DEPOSITION; SYNCHROTRON RADIATION; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING;

INCIDENCE REFLECTION;

CHROMIUM;

EID: 0038640589     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.451350     Document Type: Conference Paper

References (16)

1. K. Murakami, T. Oshino, H. Nakamura, M. Ohtani, H. Nagata, "Schwarzschild microscope for Carbon Ka radiation",Applied Optics 32, 7057-7061 (1993).
2. H. M. Hertz, M. Berglund, G. A. Johansson, M. Peuker, T. Wilhein, and H. Brismar, "Compact water-window x-raymicroscopy with a droplet laser-plasma source", X-ray Microscopy, 721, Eds. W. Mayer-Ilse, T. Warwick, andD. Attwood, American Inst. of Physics, 2000
3. S.V. Bobashov, A.V. Golubev, Yu. Ya. Platonov, L.A. Shmaenok, G.S. Volkov, N.N. Salashchenko, V.I. Zayzev"Absolute photometry of pulsed fluxes of ultrasoft x-ray radiation", Phys. Scr. 43, 356-364, 1991.
4. F. Schäfers, M. Grioni, J. Wood, H. Van Brag, E.J. Puik, M. Dapor, F. Marchetti, "Application of W/Si multilayersfor monochromatization of soft-x-ray synchrotron radiation", Proc. SPIE 984, 23-30, 1988.
5. S. DiFonzo, B.R. Müller, W. Jark, A. Gaupp, F. Schäfers, J.H. Underwood, "Multilayer transmission phase shifters for the carbon K edge and the water window", Rev. Sci. Instrument, 66, 1513 - 1516, 1995.
6. P. Cheng, G. Jan (eds.) in X-ray Microscopy: Instrumentation and Biological Applications (Springer Verlag 1987).
7. C. Jacobsen, J. Kirz, S. Williams, Resolution in soft x-ray microscopes, Ultramicroscopy 47 (1992), 55.
8. M. Toyoda, Y. Shitani, M. Yanagihara, T. Ejima, M. Yamamoto, M. Watanabe, "A soft X-ray imaging microscope with a multilayer-coated Schwarzschild objective: Imaging tests", Jpn. J. Appl. Phys. 39, 1926-1929, 2000.
9. T. Kuhlmann, S. Yulin, T. Feigl, N. Kaiser, T. Gorelic, U. Kaiser, W. Richter, "Chromium-scandium multilayer mirrors for the nitrogen Kα line in the water window region", Appl. Optics 41, 2048-2052, 2002.
10. N.N. Salashchenko, E.A. Shamov, "Short-period X-ray multilayerts based on Cr/Sc", Opt Com. 134, 7-10, 1997.
11. E. Ziegler, Y. Lepetre, I. K. Schuller and E. Spiller, "Stability of multilayer for synchrotron optics," Appl. Phys. Lett. 48, 1354-1356 (1986).
12. S.P. Vernon, D.G. Stearns, R.S. Rosen, "Ion-assisted sputter-deposition of molybdenum-silicon multilayers", Appl. Optics 32, 6969-6974, 1993.
13. F. Scholze, B. Beckhoff, G. Brandt, R. Fliegauf, R. Klein, B. Meyer, D. Rost, D. Schmitz, M. Veldkamp, J. Weser, G. Ulm, E. Louis, A.E. Yakshin, S. Oestreich, F. Bijkerk, "The new PTB beamlines for high-accuracy EUV reflectometry at BESSY II", in Soft X-ray and EUV imaging systems, W.M. Kaiser, R.H. Stulen (eds.), Proc. SPIE 4146, 72-82, 2000.
14. D.L. Windt, "IMD- Software for modeling the optical properties of multilayer films", Computers in Physics 12, 360-370, 1998.
15. V. B. Loboda, I. E. Protsenko, "Structure and electrical resistance of thin scandium films. III. Study on electrical properties", Cryst. Res. and Techn., 16 (3), 357 (1981).
16. ASM International's Binary Alloy Phase Diagrams on CD-ROM, ASM International, Materials Park, Ohio (2000).