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Volumn 228, Issue 1-4, 2004, Pages 100-109
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Removal of the photoresist (PR) and metallic-polymer in the concave-typed storage node using the excimer laser
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Author keywords
Homogenizer; KrF excimer laser; Laser cleaning; Photoresist removal; Polymer removal; Ruthenium
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Indexed keywords
CAPACITORS;
DYNAMIC RANDOM ACCESS STORAGE;
KRYPTON;
LEAKAGE CURRENTS;
MORPHOLOGY;
PERMITTIVITY;
PHOTOCHEMICAL REACTIONS;
PHOTORESISTS;
REACTIVE ION ETCHING;
RUTHENIUM;
SCANNING ELECTRON MICROSCOPY;
HOMOGENIZERS;
KRF EXCIMER LASERS;
LASER CLEANING;
PHOTORESIST REMOVAL;
POLYMER REMOVAL;
EXCIMER LASERS;
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EID: 1942517832
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2003.12.029 Document Type: Article |
Times cited : (9)
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References (20)
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