메뉴 건너뛰기




Volumn 228, Issue 1-4, 2004, Pages 100-109

Removal of the photoresist (PR) and metallic-polymer in the concave-typed storage node using the excimer laser

Author keywords

Homogenizer; KrF excimer laser; Laser cleaning; Photoresist removal; Polymer removal; Ruthenium

Indexed keywords

CAPACITORS; DYNAMIC RANDOM ACCESS STORAGE; KRYPTON; LEAKAGE CURRENTS; MORPHOLOGY; PERMITTIVITY; PHOTOCHEMICAL REACTIONS; PHOTORESISTS; REACTIVE ION ETCHING; RUTHENIUM; SCANNING ELECTRON MICROSCOPY;

EID: 1942517832     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.12.029     Document Type: Article
Times cited : (9)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.