Controllable laser-induced periodic structures at silicon-dioxide/silicon interface by excimer laser irradiation

Journal of Applied Physics

Volumn 80, Issue 12, 1996, Pages 7052-7056

  Lu, Y F ^a   Choi, W K ^a   Aoyagi, Y ^b   Kinomura, A ^c   Fujii, K ^c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^c Government Industrial Research Institute Ikeda   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001509449     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363779     Document Type: Article

References (13)

1. M. Birnbaum, J. Appl. Phys. 36, 3688 (1965).
2. D. C. Emmony, R. P. Howson, and L. J. Willis, Appl. Phys. Lett. 23, 598 (1973).
3. N. C. Kerr, S. E. Clark, and D. C. Emmony, NBS Spec. Publ. 775, 273 (1988).
4. P. A. Temple, and M. J. Soileau, IEEE J. Quantum Electron. QE-17, 2067 (1981).
5. M. J. Soileau, and E. W. Van Stryland, NBS Spec. Publ. 669, 406 (1982).
6. F. Keilmann, and Y. H. Bai, Appl. Phys. A 29, 9 (1982).
7. H. Niino and A. Yabe, J. Photochem. Photobiol. A: Chem. 65, 303 (1992).
8. J. F. Young, J. E. Sipe, J. S. Preston, and H. M. van Driel, Appl. Phys. Lett. 41, 261 (1982).
9. J. F. Young, J. E. Sipe, and H. M. van Driel, Phys. Rev. B 30, 2001 (1984).
10. A. V. Demchuk, and V. A. Labunov, Appl. Surf. Sci. 86, 353 (1995).
11. J. J. Bubowski, A. Compaan, and M. Prasad, Appl. Surf. Sci. 86, 548 (1995).
12. Laser Microfabrication-Thin Film Processes and Lithography, edited by D. J. Ehrlich and J. Y. Tsao (Academic, Boston, 1989), p. 239.
13. R. Ranjan, D. N. Lambeth, M. Tromel, P. Goglia, and Y. Li, J. Appl. Phys. 69, 57 (1991).