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Applied Physics A: Materials Science and Processing

Volumn 69, Issue 7, 1999, Pages

Cleaning of submicrometer structures on Si-masters with pulsed excimer laser and reactive ion etching

(6) Braun, A a Otte, K a Zimmer, K a Rudschuck, St a Hirsch, D a Bigl, F a

a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 25544461270 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390051413 Document Type: Article

Times cited : (5)

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