Fabrication of a gray-tone mask and pattern transfer in thick photoresists

Journal of Micromechanics and Microengineering

Volumn 8, Issue 2, 1998, Pages 95-98

  Nicolas, S ^a   Dufour Gergam, E ^a   Bosseboeuf, A ^a   Bourouina, T ^a   Gilles, J P ^a   Grandchamp, J P ^a  

^a UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; PHOTORESISTS; SURFACE PROPERTIES; THREE DIMENSIONAL;

GRAY TONE MASKS; THICK PHOTORESISTS;

MICROELECTRONIC PROCESSING;

EID: 0032091750     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/8/2/013     Document Type: Article

References (12)

1. Ferstl M, Kuhlow B and Pawlowski E 1994 Effect of fabrication errors on multilevel Fresnel zone lenses Opt. Eng. 33 1229-35
2. Anderson H, Ekberg M, Hard S, Jacobsson S. Larsson M and Nilsson T 1990 Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluation Appl. Opt. 28 4259-66
3. O'Shea D C and Rockward W S 1995 Gray-scale masks for diffractive-optics fabrication: II. Spatially filtered halftone screens Appl. Opt. 34 7518-26
4. Suleski T J and O'Shea D C 1995 Gray-scale masks for diffractive-optics fabrication: I. Commercial slide imagers Appl. Opt. 34 7507-17
5. Gex F, Roblin G, Artzner G, Bernstein L, Horville D and Serpette V 1992 The fabrication and optical characteristics of microlens arrays engraved in photoresist coatings SPIE 1781 1311-5
6. Stauffer J M, Oppliger Y, Regnault P, Barldi L and Gale M T 1992 Electron beam writing of continuous resist profiles for optical applications J. Vuc. Sci. Technol. B 10 2526-9
7. Däschner W, Long P, Larsson M and Lee SH 1995 Fabrication of diffractive optical elements using a single optical exposure with a gray level mask J. Vac. Sci. Technol. B 13 2729-31
8. Oppliger Y, Sixt P, Stauffer J M, Mayor J M, Regnault P and Voirin G 1994 One-step 3D shaping using a gray-tone mask for optical and microelectronic applications Microelectron. Eng. 23 449-54
9. Purdy D R 1994 Fabrication of complex micro-optic components using photo-sculpting through halftone transmission masks Pure Appl. Opt. 3 167-75
10. Wagner B, Quenzer H J, Henke W, Hoppe W and Pilz W 1995 Microfabrication of complex surface topographies using gray-tone lithography Sensors Actuators A 46-47 89-94
11. Suleski T J and O'Shea D C 1995 Fidelity of postscript-generated masks for diffractive optics fabrication Appl. Opt. 34 627-34
12. Bauer J and Drescher G 1996 Surface tension, adhesion and wetting of materials for photolithographic process J. Vac. Sci. Technol. B 14 2485-92