E-beam lithography - An efficient tool for the fabrication of diffractive and microoptical elements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3008, Issue , 1997, Pages 222-232

  Kley, E B ^a   Schnabel, B ^a   Zeitner, U D ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Diffractive optics; E beam lithography; Microoptics

Indexed keywords

DIFFRACTIVE OPTICS; MICROOPTICS; PHOTOLITHOGRAPHY; SURFACE STRUCTURE;

MICROOPTICAL ELEMENTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031371843     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.271417     Document Type: Conference Paper

References (10)

1. Blazed gratings and fresnellenses fabricated by electron-beam lithography
2. Corrections to proximity effects in electron beam lithography
3. Direct writing of continuous-relief micro-optics
4. One-step 3D shaping using a gray-tone mask for optical and microelectronic applications
5. One step lithography for mass production of multilevel diffractive optical elements using High Energy Beam Sensitive (HEBS) grey-level mask
6. E-beam lithograpy: A suitable technology for fabrication of high-accuracy 2D and 3D surface profiles
7. Efficient focusing and beam shaping grating couplers into polymer waveguides
8. Fabrication of diffractive optical elements using a single optical exposure with a grey level mask
9. Fabrication and application of subwavelength gratings
10. Application of metallic subwavelength gratings for polarization devices