Sputtering of Ge(001): Transition between dynamic scaling regimes

Surface Science

Volumn 377-379, Issue , 1997, Pages 1038-1041

  Smilgies, Detlef M ^a   Eng, Peter J ^b   Landemark, Erik ^c   Nielsen, Mourits ^d  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b UNIVERSITY OF CHICAGO   (United States)

^c LINKÖPING UNIVERSITY   (Sweden)

^d TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

Germanium; Sputtering; Surface dynamics; X ray diffraction

Indexed keywords

ACTIVATION ENERGY; SPUTTERING; SURFACE PROPERTIES; SURFACE STRUCTURE; THERMAL EFFECTS; X RAY CRYSTALLOGRAPHY;

ARRHENIUS BEHAVIOR; DYNAMIC SCALING; SURFACE TEMPERATURE; SYNCHROTRON X RAY DIFFRACTION;

GERMANIUM;

EID: 17944397720     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01541-5     Document Type: Article

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