Influence of deposition parameters in the fabrication of a large-area narrow band-pass filter of bandwidth on subnanometer scale

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 577-583

  Lee, Cheng Chung ^a   Chen, Sheng Hui ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

DWDM filter; IAD; Layer thickness; Optical constant; Vacuum

Indexed keywords

BANDWIDTH; CURRENT DENSITY; DEPOSITION; FIBER OPTICS; OPTICAL COMMUNICATION; OPTICAL FIBER FABRICATION; VACUUM APPLICATIONS;

LAYER THICKNESS; OPTICAL CONSTANT; SUBNANOMETER SCALE;

BANDPASS FILTERS;

EID: 2442459641     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.030     Document Type: Article

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