Rapid thermal annealing effects on blue luminescence of As-implanted GaN

Journal of Applied Physics

Volumn 92, Issue 7, 2002, Pages 4129-4131

  Huang, H Y ^a   Xiao, J Q ^a   Ku, C S ^a   Chung, H M ^a   Chen, W K ^a   Chen, W H ^a   Lee, M C ^a   Lee, H Y ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b MINGHSIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AS-IMPLANTATION; BLUE LUMINESCENCE; LOW TEMPERATURES; METAL-ORGANIC; PHOTOLUMINESCENCE EXCITATION MEASUREMENTS; THERMAL ANNEALING EFFECTS; THERMAL ANNEALING TREATMENT; VAPOR PHASIS;

ACTIVATION ENERGY; GALLIUM NITRIDE; LUMINESCENCE; PHOTOEXCITATION; VAPORS;

RAPID THERMAL ANNEALING;

EID: 18644373157     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1503160     Document Type: Article

References (17)

1. H. Amano, M. Kito, K. Hiramatsu, and I. Akasaki, Jpn. J. Appl. Phys., Part 2 28, L2112 (1989). jjc JAPLD8 0021-4922
2. S. Nakamura, N. Iwasa, M. Senoh, and T. Mukai, Jpn. J. Appl. Phys., Part 1 31, 1258 (1992). jjb JAPNDE 0021-4922
3. C. K. Shu, J. Ou, H. C. Lin, W. K. Chen, and M. C. Lee, Appl. Phys. Lett. 73, 641 (1998). apl APPLAB 0003-6951
4. H. M. Chung, W. C. Chuang, Y. C. Pan, C. C. Tsai, M. C. Lee, W. H. Chen, W. K. Chen, C. I. Chiang, C. H. Lin, and H. Chang, Appl. Phys. Lett. 76, 897 (2000). apl APPLAB 0003-6951
5. S. H. Wei and A. Zunger, Phys. Rev. Lett. 76, 664 (1996). prl PRLTAO 0031-9007
6. J. I. Pankove and J. A. Hutchby, J. Appl. Phys. 47, 5387 (1976). jap JAPIAU 0021-8979
7. H. Y. Huang, W. C. Lin, W. H. Lee, C. K. Shu, K. C. Liao, W. K. Chen, M. C. Lee, W. H. Chen, and Y. Y. Lee, Appl. Phys. Lett. 77, 2819 (2000). apl APPLAB 0003-6951
8. H. Y. Huang, C. H. Chuang, C. K. Shu, Y. C. Pan, W. H. Lee, W. K. Chen, W. K. Chen, and M. C. Lee, Appl. Phys. Lett. 80, 3349 (2002). apl APPLAB 0003-6951
9. C. G. Van de Walle and J. Neugebauer, Appl. Phys. Lett. 76, 1009 (2000). apl APPLAB 0003-6951
10. M. Kuball and J. M. Hayes, J. Appl. Phys. 87, 2736 (2000). jap JAPIAU 0021-8979
11. T. Mattila and A. Zunger, Phys. Rev. B 58, 1367 (1998). prb PRBMDO 0163-1829
12. D. W. Jenkins and J. D. Dow, Phys. Rev. B 50, 8067 (1989). prb PRBMDO 0163-1829
13. T. Mattila and A. Zunger, Phys. Rev. B 59, 9943 (1999). prb PRBMDO 0163-1829
14. T. Ogino and M. Aoki, Jpn. J. Appl. Phys., Part 1 18, 1049 (1979). jja JJAPA5 0021-4922
15. A. Hofman, L. Eckey, P. Maxim, J. Cr. Holst, R. Heitz, D. M. Hofmann, D. Kovalev, G. Steude, D. Volm, B. K. Meyer, T. Detchprohm, H. Amano, and I. Akasaki, Solid-State Electron. 41, 275 (1997). sel SSELA5 0038-1101
16. J. Li, K. B. Nam, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 79, 3245 (2001). apl APPLAB 0003-6951
17. X. Li, S. Kim, E. E. Reuter, S. G. Bishop, and J. J. Coleman, Appl. Phys. Lett. 72, 1990 (1998). apl APPLAB 0003-6951