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Applied Physics A: Materials Science and Processing

Volumn 75, Issue 6, 2002, Pages 667-672

Carbon precipitation and diffusion in SiGeC alloys under silicon self-interstitial injection

(10) De Salvador, D a Coati, A a Napolitani, E a Berti, M a Drigo, A V a Carroll, M S b Sturm, J C b Stangl, J c Bauer, G c Lazzarini, L d

a INFM (Italy)

b Princeton University (United States)

c JOHANNES KEPLER UNIVERSITY LINZ (Austria)

d CNR (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; DIFFUSION IN SOLIDS; INTERFACES (MATERIALS); OXIDATION; PRECIPITATION (CHEMICAL);

SELF-INTERSTITIAL INJECTION;

SILICON ALLOYS;

EID: 18544379944 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390201291 Document Type: Article

Times cited : (1)

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