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Volumn 7, Issue 4, 2004, Pages

Atomic Layer Deposition of Hafnium Silicate Thin Films Using HfCl 2[N(SiMe3)2]2 and H2O

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARRIER CONCENTRATION; COMPOSITION; DEPOSITION; FILM GROWTH; HAFNIUM COMPOUNDS; OPTIMIZATION; OXIDATION; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 1842582460     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1651392     Document Type: Article
Times cited : (18)

References (10)
  • 10
    • 0000300191 scopus 로고
    • D. T. J. Hurle, Editor, Elsevier, Amsterdam
    • T. Suntola, in Handbook of Crystal Growth, D. T. J. Hurle, Editor, Vol. 3, p. 601., Elsevier, Amsterdam (1994).
    • (1994) Handbook of Crystal Growth , vol.3 , pp. 601
    • Suntola, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.