Preferential growth of α′-FeN films under a high magnetic field

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 10 A, 2002, Pages

  Wang, Heying ^a,b   Mitani, Seiji ^a,c   Fujimori, Hiroyasu ^d   Motokawa, Mitsuhiro ^a,c  

^a TOHOKU UNIVERSITY   (Japan)

^b TSINGHUA UNIVERSITY   (China)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^d Research Institute of Electric and Magnetic Alloys Sendai   (Japan)

Author keywords

Crystallographic orientation; High magnetic field; Magnetic property; Sputtering; Thin film; FeN

Indexed keywords

CRYSTALLOGRAPHY; FILM GROWTH; IRON COMPOUNDS; MAGNETIC FIELD EFFECTS; MAGNETIZATION; SINGLE CRYSTALS; SPUTTER DEPOSITION;

CRYSTALLOGRAPHIC ORIENTATION;

MAGNETIC THIN FILMS;

EID: 0036815560     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l1075     Document Type: Article

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