Microstructural modification of TiN deposited by magnetron ion plating: Influence of magnetic field configuration

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 463-467

  Zlatanović, Miodrag ^a   Popović, Nada ^b   Bogdanov, Žarko ^b   Beloševac, Radomir ^a   Kunosić, Amir ^a   Goncić, Bratislav ^b  

^a Faculty of Electrical Engineering   (Yugoslavia)

^b UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

Magnetron ion plating; Sputtering; Tin

Indexed keywords

CRYSTAL ORIENTATION; FILM GROWTH; IONS; MAGNETIC FIELDS; MAGNETRON SPUTTERING; MAGNETRONS; MORPHOLOGY; PLATING; SUBSTRATES; TEXTURES; TITANIUM NITRIDE;

MAGNETRON ION PLATING; MICROSTRUCTURAL MODIFICATION;

THIN FILMS;

EID: 0032051002     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00557-9     Document Type: Article

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