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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4550-4555

Effects of crossed magnetic fields on silicon particles in plasma chemical vapor deposition process

(3) Fujiyama, Hiroshi a Maemura, Yoko a Ohtsu, Mikio a

a NAGASAKI UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; MAGNETIC FIELD EFFECTS; PARTICLES (PARTICULATE MATTER); SCANNING ELECTRON MICROSCOPY; SILANES; THIN FILMS;

DUSTY PLASMA; MODULATED ELECTROMAGNETIC FIELD; SILANE DISCHARGE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0033157663 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.38.4550 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.