Process monitoring of chrome dry-etching with RF sensor for reticle production beyond 90-nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 85-92

  Handa, Hitoshi ^a   Yamauchi, Satoshi ^a   Maruyama, Hiroshi ^a   Ishimoto, Satoshi ^a   Kosugi, Makoto ^a   Miyahara, Yutaka ^a   Uryu, Toshibumi ^b   Yokoyama, Toshifumi ^b   Naito, Akihiko ^b  

^a FUJITSU LABORATORIES LTD   (Japan)

^b DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

CD control; Chrome dry etching; Endpoint detection; RF sensor

Indexed keywords

ANODES; EMISSION SPECTROSCOPY; HARMONIC ANALYSIS; LASER APPLICATIONS; MATHEMATICAL MODELS; SENSORS; SIGNAL PROCESSING; SPECTRUM ANALYSIS; THIN FILMS; ULTRAVIOLET RADIATION;

CD CONTROL; CHROME DRY-ETCHING; ENDPOINT DETECTION; RADIO FREQUENCY SENSOR;

DRY ETCHING;

EID: 1842580490     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518337     Document Type: Conference Paper

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